Application of nonalloyed PdGe ohmic contact to self-aligned gate AlGaAs/InGaAs pseudomorphic high-electron-mobility transistor
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چکیده
منابع مشابه
Optimization of Ohmic Contact Metallization Process for AlGaN/GaN High Electron Mobility Transistor
Copyright 2013 KIEEME. All rights reserved. This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted noncommercial use, distribution, and reproduction in any medium, provided the original work is properly cited. Optimization of Ohmic Contact Metallization Proc...
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ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 1999
ISSN: 0003-6951,1077-3118
DOI: 10.1063/1.124040